Surface processing for area selective mist deposition of nanocrystalline quantum dot films

J. H. Chao, A. Kshirsagar, J. Ruzyllo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

This study explores surface engineering for the purpose of selective deposition of cadmium selenide (CdSe) nanocrystalline quantum dot (NQD) thin films using the process of mist deposition. Surfaces of silicon and/or glass substrates were made uniformly hydrophobic by exposure to trichloro (1H,1H,2H,2H-perfluorooctyl) silane (FOTS) anhydrous hexane solution. Subsequent localized UV exposure increased surface energy making it locally hydrophilic, and thus, allowing area selective deposition of NQD film. Electric field involved in the mist deposition process was shown to reverse process selectivity through the electrowetting effect. The role of IR rapid optical surface treatment (ROST) in controlling surface energy of FOTS material was explored. Findings of this study will allow area selective deposition of the variety of NQD precursors in the form of colloidal solution.

Original languageEnglish (US)
Title of host publicationECS Transactions
PublisherElectrochemical Society Inc.
Pages311-316
Number of pages6
Edition6
ISBN (Electronic)9781607684510
DOIs
StatePublished - 2013

Publication series

NameECS Transactions
Number6
Volume58
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

All Science Journal Classification (ASJC) codes

  • General Engineering

Cite this