Surface profile measurement using chromatic confocal microscopy

Kebin Shi; Peng Li; Shizhuo Yin; Zhiwen Liu

doi:10.1117/12.571595

Surface profile measurement using chromatic confocal microscopy

Kebin Shi, Peng Li, Shizhuo Yin, Zhiwen Liu

Research output: Contribution to journal › Conference article › peer-review

7 Scopus citations

Abstract

We investigate lateral and axial chromatic confocal microscopy using supercontinuum white light, and its application to surface profile measurement. In the systems that we describe here, the lateral or the axial scanning is effectively realized by focusing different wavelengths of the supercontinuum to either different lateral or axial positions through purposely introduced chromatic dispersion and aberration respectively. As a result, the imaging speed can be greatly improved. We use this system to demonstrate the surface profile measurement of a microcircuit chip, with a sensitivity of 8.5 nm and a depth measurement range of about 7 μm.

Original language	English (US)
Article number	19
Pages (from-to)	124-131
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	5606
DOIs	https://doi.org/10.1117/12.571595
State	Published - 2004
Event	Two- and Three-Dimensional Vision Systems for Inspection, Control, and Metrology II - Philadelphia, PA, United States Duration: Oct 26 2004 → Oct 27 2004

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.571595

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@article{1bac49f9b2a144128c524bf72866899c,

title = "Surface profile measurement using chromatic confocal microscopy",

abstract = "We investigate lateral and axial chromatic confocal microscopy using supercontinuum white light, and its application to surface profile measurement. In the systems that we describe here, the lateral or the axial scanning is effectively realized by focusing different wavelengths of the supercontinuum to either different lateral or axial positions through purposely introduced chromatic dispersion and aberration respectively. As a result, the imaging speed can be greatly improved. We use this system to demonstrate the surface profile measurement of a microcircuit chip, with a sensitivity of 8.5 nm and a depth measurement range of about 7 μm.",

author = "Kebin Shi and Peng Li and Shizhuo Yin and Zhiwen Liu",

year = "2004",

doi = "10.1117/12.571595",

language = "English (US)",

volume = "5606",

pages = "124--131",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Two- and Three-Dimensional Vision Systems for Inspection, Control, and Metrology II ; Conference date: 26-10-2004 Through 27-10-2004",

}

TY - JOUR

T1 - Surface profile measurement using chromatic confocal microscopy

AU - Shi, Kebin

AU - Li, Peng

AU - Yin, Shizhuo

AU - Liu, Zhiwen

PY - 2004

Y1 - 2004

N2 - We investigate lateral and axial chromatic confocal microscopy using supercontinuum white light, and its application to surface profile measurement. In the systems that we describe here, the lateral or the axial scanning is effectively realized by focusing different wavelengths of the supercontinuum to either different lateral or axial positions through purposely introduced chromatic dispersion and aberration respectively. As a result, the imaging speed can be greatly improved. We use this system to demonstrate the surface profile measurement of a microcircuit chip, with a sensitivity of 8.5 nm and a depth measurement range of about 7 μm.

AB - We investigate lateral and axial chromatic confocal microscopy using supercontinuum white light, and its application to surface profile measurement. In the systems that we describe here, the lateral or the axial scanning is effectively realized by focusing different wavelengths of the supercontinuum to either different lateral or axial positions through purposely introduced chromatic dispersion and aberration respectively. As a result, the imaging speed can be greatly improved. We use this system to demonstrate the surface profile measurement of a microcircuit chip, with a sensitivity of 8.5 nm and a depth measurement range of about 7 μm.

UR - http://www.scopus.com/inward/record.url?scp=17644392458&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=17644392458&partnerID=8YFLogxK

U2 - 10.1117/12.571595

DO - 10.1117/12.571595

M3 - Conference article

AN - SCOPUS:17644392458

SN - 0277-786X

VL - 5606

SP - 124

EP - 131

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

M1 - 19

T2 - Two- and Three-Dimensional Vision Systems for Inspection, Control, and Metrology II

Y2 - 26 October 2004 through 27 October 2004

ER -

Surface profile measurement using chromatic confocal microscopy

Abstract

All Science Journal Classification (ASJC) codes

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