Keyphrases
Plasma-enhanced Chemical Vapor Deposition (PECVD)
100%
Active Manganese
100%
Electroactive
100%
Manganese Oxide Film
100%
Manganese Oxide
80%
Electrochemically Active
20%
High Purity
20%
Supercapacitor Electrode
20%
Good Stability
20%
Asymmetric Supercapacitor
20%
Film Geometry
20%
Oxidation State
20%
Methylcyclopentadienyl Manganese Tricarbonyl
20%
Cyclability
20%
Processing Conditions
20%
Carbon Fiber Electrode
20%
Electrochemical Testing
20%
Specific Capacitance
20%
Aqueous Electrolyte
20%
Controllable Thickness
20%
High Specific Capacitance
20%
Metal Oxide Thin Films
20%
Processing Effects
20%
Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Oxide Film
75%
Supercapacitor
25%
Processing Condition
25%
Ray Photoelectron Spectroscopy
25%
Material Science
Plasma-Enhanced Chemical Vapor Deposition
100%
Manganese Oxide
100%
Oxide Film
33%
Asymmetric Supercapacitor
11%
Carbon Fiber
11%
Chemical Engineering
Manganese Oxide
100%
Plasma Enhanced Chemical Vapor Deposition
100%
Carbon Fiber
11%