Synthesis science of SrRuO3 and CaRuO3 epitaxial films with high residual resistivity ratios

  • Hari P. Nair
  • , Yang Liu
  • , Jacob P. Ruf
  • , Nathaniel J. Schreiber
  • , Shun Li Shang
  • , David J. Baek
  • , Berit H. Goodge
  • , Lena F. Kourkoutis
  • , Zi Kui Liu
  • , Kyle M. Shen
  • , Darrell G. Schlom

Research output: Contribution to journalArticlepeer-review

Abstract

Epitaxial SrRuO3 and CaRuO3 films were grown under an excess flux of elemental ruthenium in an adsorption-controlled regime by molecular-beam epitaxy (MBE), where the excess volatile RuOx (x = 2 or 3) desorbs from the growth front leaving behind a single-phase film. By growing in this regime, we were able to achieve SrRuO3 and CaRuO3 films with residual resistivity ratios (ρ300 K4 K) of 76 and 75, respectively. A combined phase stability diagram based on the thermodynamics of MBE (TOMBE) growth, termed a TOMBE diagram, is employed to provide improved guidance for the growth of complex materials by MBE.

Original languageEnglish (US)
Article number046101
JournalAPL Materials
Volume6
Issue number4
DOIs
StatePublished - Apr 1 2018

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • General Engineering

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