Abstract
We report on the experimental temperature-dependent characteristics of vertical In0.53Ga0.47As tunnel field-effect transistors (TFETs) at low drain bias to provide key insight into its device operation and design. Leakage floor IOFF) is determined by the ungated p +-i-n+ reverse bias leakage and is dominated by Shockley-Read-Hall generationrecombination current. The temperature dependence of subthreshold slope arises from tunneling into mid-gap states at the oxidesemiconductor interface, followed by thermal emission into the conduction band. At intermediate gate voltages, pure band-to-band tunneling dominates, while at higher gate voltages, current transport is diffusion limited. The temperature-dependent study of In0.53Ga0.47 TFET highlights the importance of passivating the IIIV and dielectric interface.
Original language | English (US) |
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Article number | 5451179 |
Pages (from-to) | 564-566 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 31 |
Issue number | 6 |
DOIs | |
State | Published - Jun 2010 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering