A study was conducted to demonstrate the performance of plasma lithography as a technique to pattern different surfaces to guide the self-assembly of quantum dots and other nanoscale building blocks. Plasma lithography was used to achieve pattern resolution of 100nm to 1 cm in size using simple procedures and equipment and to provide control over the resultant quantum-dot density. The fabrication method involved creating a nanoscale mold with 3D topography that when placed in contact with a substrate can shield selective areas of the substrate from the modification of a plasma, while allowed plasma surface treatment with other exposed areas. 3D molds were placed on polystyrene substrates during plasma treatment to spatially functionalize the polystyrene surface to create templates for self-assembly of quantum dots. It was concluded that the plasma lithography technique can be used for biomedical, material science, and nanophotonic applications.
All Science Journal Classification (ASJC) codes
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering