The effect of deposition conditions on the radiation tolerance of BPSG films

Robert Fuller; Howard Evans; Carol Gamlen; Bill Czagas; Michael Morrison; David Decrosta; Robert Lowry; Patrick Lenahan; Christopher Frye

doi:10.1109/23.556837

The effect of deposition conditions on the radiation tolerance of BPSG films

Robert Fuller, Howard Evans, Carol Gamlen, Bill Czagas, Michael Morrison, David Decrosta, Robert Lowry, Patrick Lenahan, Christopher Frye

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

A study has been conducted of the effects of deposition conditions on the radiation hardness of borophosphosilicate glass (BPSG). Films deposited by two common deposition techniques were evaluated using gamma cell testing, electron spin resonance (ESR), and capacitance voltage (CV) measurements. The results indicate that two stoichiometrically similar films can differ greatly in radiation tolerance depending on the deposition conditions.

Original language	English (US)
Pages (from-to)	2565-2571
Number of pages	7
Journal	IEEE Transactions on Nuclear Science
Volume	43
Issue number	6 PART 1
DOIs	https://doi.org/10.1109/23.556837
State	Published - 1996

All Science Journal Classification (ASJC) codes

Nuclear and High Energy Physics
Nuclear Energy and Engineering
Electrical and Electronic Engineering

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10.1109/23.556837

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abstract = "A study has been conducted of the effects of deposition conditions on the radiation hardness of borophosphosilicate glass (BPSG). Films deposited by two common deposition techniques were evaluated using gamma cell testing, electron spin resonance (ESR), and capacitance voltage (CV) measurements. The results indicate that two stoichiometrically similar films can differ greatly in radiation tolerance depending on the deposition conditions.",

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AU - Fuller, Robert

AU - Evans, Howard

AU - Gamlen, Carol

AU - Czagas, Bill

AU - Morrison, Michael

AU - Decrosta, David

AU - Lowry, Robert

AU - Lenahan, Patrick

AU - Frye, Christopher

PY - 1996

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AB - A study has been conducted of the effects of deposition conditions on the radiation hardness of borophosphosilicate glass (BPSG). Films deposited by two common deposition techniques were evaluated using gamma cell testing, electron spin resonance (ESR), and capacitance voltage (CV) measurements. The results indicate that two stoichiometrically similar films can differ greatly in radiation tolerance depending on the deposition conditions.

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The effect of deposition conditions on the radiation tolerance of BPSG films

Abstract

All Science Journal Classification (ASJC) codes

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