The effect of film edge shapes on the stress field for a multilayered semiconductor structure: A finite-element analysis study

Keyphrases

• Dislocation 100%
• Finite Element Analysis 100%
• Stress Field 100%
• Semiconductor Structures 100%
• Shear Stress Distribution 100%
• Resolved Shear Stress 100%
• Edge Shape 100%
• Stress Distribution 50%
• Temperature Variation 50%
• Stress-induced 50%
• GaAs Substrate 50%
• Thermal Stress 50%
• InGaAs 50%
• SiO2 Film 50%
• Stress Value 50%
• Critical Resolved Shear Stress 50%

Engineering

• Stress Field 100%
• Shear Stress Distribution 100%
• Semiconductor Structure 100%
• Film Edge 100%
• Resolved Shear Stress 100%
• Indium Gallium Arsenide 50%
• Thermal Stress 50%
• Gaas Substrate 50%
• Sio2 Film 50%
• Original Shape 50%
• Critical Resolved Shear Stress 50%