The effects of processing on the phase, structure and properties of thick Gd₂O₃ films deposited by reactive electron-beam physical vapor deposition (EB-PVD)

Keyphrases

• Phase Properties 100%
• Phase Structure 100%
• Processing Effects 100%
• Electron Beam Physical Vapor Deposition (EB-PVD) 100%
• Gd2O3 100%
• Deposition Parameters 40%
• Oxides 20%
• Grain Size 20%
• Gadolinium 20%
• Detection Efficiency 20%
• Electrical Properties 20%
• High Temperature 20%
• Size-density 20%
• Hexagonal Phase 20%
• Surface Roughness 20%
• Monoclinic Phase 20%
• Monoclinic 20%
• Optical Properties 20%
• Processing Conditions 20%
• High Thermals 20%
• Film Thickness 20%
• Thermal Neutron 20%
• Deposition Conditions 20%
• Ion Beam Assisted Deposition 20%
• Metastable Phases 20%
• Deposition Rate 20%
• Process-structure-property Relationship 20%
• Cubic Phase 20%
• Oxygen Flow Rate 20%
• Integral Component 20%
• Polymorph 20%
• Phase Stability 20%
• Phase Orientation 20%
• Neutron Detection 20%
• Gadolinium-based 20%
• Mean Free Path 20%
• Residual Stress State 20%
• Film Properties 20%

Engineering

• Deposited Film 100%
• Phase Structure 100%
• Physical Vapor Deposition 100%
• Monoclinic 66%
• Deposition Parameter 66%
• Thermal Neutron 66%
• Flow Rate 33%
• Stress State 33%
• Nonequilibrium 33%
• Significant Change 33%
• Processing Condition 33%
• Residual Stress 33%
• Induced Stress 33%
• Property Relationship 33%
• Mixed Phase 33%
• Deposition Condition 33%
• Deposition Rate 33%
• Phase Stability 33%
• Mean Free Path 33%
• Assisted Deposition 33%
• Grain Orientation 33%
• Metastable Phase 33%
• Capture Cross Section 33%

Material Science

• Film 100%
• Phase Structure 100%
• Electron Beam Physical Vapor Deposition 100%
• Gadolinium 42%
• Grain Size 14%
• Density 14%
• Oxide Compound 14%
• Surface Roughness 14%
• Optical Property 14%
• Residual Stress 14%
• Film Thickness 14%
• Polymorphism 14%
• Ion Beam Assisted Deposition 14%