The influence of 173 MeV Xe-ion irradiation on the microstructure of YBa2Cu3O7 thin films

H. Watanabe; Bernd C. Kabius; K. Urban; B. Roas; S. Klaumünzer; G. Saemann-Ischenko

doi:10.1016/0921-4534(91)90013-O

The influence of 173 MeV Xe-ion irradiation on the microstructure of YBa₂Cu₃O₇ thin films

H. Watanabe, Bernd C. Kabius, K. Urban, B. Roas, S. Klaumünzer, G. Saemann-Ischenko

Materials Research Institute (MRI)

Research output: Contribution to journal › Article › peer-review

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Abstract

YBa₂Cu₃O₇ thin films grown epitaxially on [001] SrTiO₃ substrates have been irradiated at a temperature of 77 K with 173 MeV Xe-ions up to a dose of 3×10¹⁶ m^-2. A study of the irradiated films by transmission electron microscopy revealed amorphous channels with diameters between 2 and 4 nm. The density of these channels depended on the irradiated dose. The twin structure of the orthorhombic phase of YBa₂Cu₃O₇ was found to disappear for high irradiation doses. It is concluded that the amorphous regions were introduced along the paths of Xe-ions as a results of electronic excitation. These regions can act as pinning centres for magnetic flux lines.

Original language	English (US)
Pages (from-to)	75-84
Number of pages	10
Journal	Physica C: Superconductivity and its applications
Volume	179
Issue number	1-3
DOIs	https://doi.org/10.1016/0921-4534(91)90013-O
State	Published - Aug 15 1991

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Energy Engineering and Power Technology
Electrical and Electronic Engineering

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10.1016/0921-4534(91)90013-O

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title = "The influence of 173 MeV Xe-ion irradiation on the microstructure of YBa2Cu3O7 thin films",

abstract = "YBa2Cu3O7 thin films grown epitaxially on [001] SrTiO3 substrates have been irradiated at a temperature of 77 K with 173 MeV Xe-ions up to a dose of 3×1016 m-2. A study of the irradiated films by transmission electron microscopy revealed amorphous channels with diameters between 2 and 4 nm. The density of these channels depended on the irradiated dose. The twin structure of the orthorhombic phase of YBa2Cu3O7 was found to disappear for high irradiation doses. It is concluded that the amorphous regions were introduced along the paths of Xe-ions as a results of electronic excitation. These regions can act as pinning centres for magnetic flux lines.",

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T1 - The influence of 173 MeV Xe-ion irradiation on the microstructure of YBa2Cu3O7 thin films

AU - Watanabe, H.

AU - Kabius, Bernd C.

AU - Urban, K.

AU - Roas, B.

AU - Klaumünzer, S.

AU - Saemann-Ischenko, G.

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AB - YBa2Cu3O7 thin films grown epitaxially on [001] SrTiO3 substrates have been irradiated at a temperature of 77 K with 173 MeV Xe-ions up to a dose of 3×1016 m-2. A study of the irradiated films by transmission electron microscopy revealed amorphous channels with diameters between 2 and 4 nm. The density of these channels depended on the irradiated dose. The twin structure of the orthorhombic phase of YBa2Cu3O7 was found to disappear for high irradiation doses. It is concluded that the amorphous regions were introduced along the paths of Xe-ions as a results of electronic excitation. These regions can act as pinning centres for magnetic flux lines.

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The influence of 173 MeV Xe-ion irradiation on the microstructure of YBa₂Cu₃O₇ thin films

Abstract

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