Abstract
The influence of ion bombardment damage on the properties of Au/GaAs Schottky barriers has been studied with 10-keV Ar implanted into both n-type and p-type GaAs over the dose range 1012-101 5 cm-2. Electrical characteristics determined over a wide temperature range (77-360 K) reveal a number of phenomena dictating barrier modification and carrier transport across the Au/GaAs interface: Change in Schottky barrier height due to defect levels introduced by ion damage, the very low threshold dose for barrier modification, increased series resistance, and creation of a shunt conducting path. Partial dynamic annealing of defects is also observed under high-temperature (≅200 °C) implantation.
Original language | English (US) |
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Pages (from-to) | 2371-2375 |
Number of pages | 5 |
Journal | Journal of Applied Physics |
Volume | 65 |
Issue number | 6 |
DOIs | |
State | Published - 1989 |
All Science Journal Classification (ASJC) codes
- General Physics and Astronomy