The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

G. L. Fisher; A. Hooper; R. L. Opila; D. R. Jung; D. L. Allara; N. Winograd

doi:10.1016/s0368-2048(98)00283-7

The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

G. L. Fisher
, A. Hooper
, R. L. Opila
, D. R. Jung
, D. L. Allara
, N. Winograd

Research output: Contribution to journal › Article › peer-review

29 Scopus citations

Abstract

The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH₂)₁₅CO₂CH₃) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.

Original language	English (US)
Pages (from-to)	139-148
Number of pages	10
Journal	Journal of Electron Spectroscopy and Related Phenomena
Volume	98-99
DOIs	https://doi.org/10.1016/s0368-2048(98)00283-7
State	Published - Jan 1999

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Radiation
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Spectroscopy
Physical and Theoretical Chemistry

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Fisher, G. L., Hooper, A., Opila, R. L., Jung, D. R., Allara, D. L., & Winograd, N. (1999). The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. Journal of Electron Spectroscopy and Related Phenomena, 98-99, 139-148. https://doi.org/10.1016/s0368-2048(98)00283-7

Fisher, G. L. ; Hooper, A. ; Opila, R. L. et al. / The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. In: Journal of Electron Spectroscopy and Related Phenomena. 1999 ; Vol. 98-99. pp. 139-148.

@article{41ee58472ffc4ec0964733675137f107,

title = "The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy",

abstract = "The deposition of 2 {\AA} of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.",

author = "Fisher, \{G. L.\} and A. Hooper and Opila, \{R. L.\} and Jung, \{D. R.\} and Allara, \{D. L.\} and N. Winograd",

note = "Funding Information: Financial support for this research was provided by the Office of Naval Research, the National Science Foundation and the National Institutes of Health. N. W. would like to acknowledge a long scientific interaction and personal friendship with C.R. Brundle. These relationships extend back to the Namur meeting on X-ray photoelectron spectroscopy in 1974. The proceedings of that meeting, of course, constituted an important volume for this journal. At that time Brundle was focusing on the use of XPS to characterize metal and metal-oxide surfaces, a topic close to our interests as well. Some of his challenges directly inspired our group to take up the use of ion/solid interactions for surface characterization and to complement XPS measurements, an approach we have been pursuing ever since. I recall a burning issue from those days – whether to plot binding energy from right-to-left of left-to-right. Brundle solved the problem by using both conventions, sometimes in the same lecture.",

year = "1999",

month = jan,

doi = "10.1016/s0368-2048(98)00283-7",

language = "English (US)",

volume = "98-99",

pages = "139--148",

journal = "Journal of Electron Spectroscopy and Related Phenomena",

issn = "0368-2048",

publisher = "Elsevier B.V.",

}

Fisher, GL, Hooper, A, Opila, RL, Jung, DR, Allara, DL & Winograd, N 1999, 'The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy', Journal of Electron Spectroscopy and Related Phenomena, vol. 98-99, pp. 139-148. https://doi.org/10.1016/s0368-2048(98)00283-7

The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. / Fisher, G. L.; Hooper, A.; Opila, R. L. et al.
In: Journal of Electron Spectroscopy and Related Phenomena, Vol. 98-99, 01.1999, p. 139-148.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

AU - Fisher, G. L.

AU - Hooper, A.

AU - Opila, R. L.

AU - Jung, D. R.

AU - Allara, D. L.

AU - Winograd, N.

N1 - Funding Information: Financial support for this research was provided by the Office of Naval Research, the National Science Foundation and the National Institutes of Health. N. W. would like to acknowledge a long scientific interaction and personal friendship with C.R. Brundle. These relationships extend back to the Namur meeting on X-ray photoelectron spectroscopy in 1974. The proceedings of that meeting, of course, constituted an important volume for this journal. At that time Brundle was focusing on the use of XPS to characterize metal and metal-oxide surfaces, a topic close to our interests as well. Some of his challenges directly inspired our group to take up the use of ion/solid interactions for surface characterization and to complement XPS measurements, an approach we have been pursuing ever since. I recall a burning issue from those days – whether to plot binding energy from right-to-left of left-to-right. Brundle solved the problem by using both conventions, sometimes in the same lecture.

PY - 1999/1

Y1 - 1999/1

N2 - The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.

AB - The deposition of 2 Å of Al metal onto a monolayer of methylester-terminated alkanethiolate (HS(CH2)15CO2CH3) self-assembled on polycrystalline Au(111) was studied using time-of-flight secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS) and infrared reflectance spectroscopy (IRS). The deposited Al was found to be highly reactive with the oxygen atoms in the self-assembled monolayer terminal functional group. No reactivity between Al and the methylene backbone of the monolayer was observed, nor was any Al observed at the monolayer/Au interface. However, the deposition of Al does induce some chain disordering.

UR - https://www.scopus.com/pages/publications/0006678602

UR - https://www.scopus.com/pages/publications/0006678602#tab=citedBy

U2 - 10.1016/s0368-2048(98)00283-7

DO - 10.1016/s0368-2048(98)00283-7

M3 - Article

AN - SCOPUS:0006678602

SN - 0368-2048

VL - 98-99

SP - 139

EP - 148

JO - Journal of Electron Spectroscopy and Related Phenomena

JF - Journal of Electron Spectroscopy and Related Phenomena

ER -

Fisher GL, Hooper A, Opila RL, Jung DR, Allara DL, Winograd N. The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy. Journal of Electron Spectroscopy and Related Phenomena. 1999 Jan;98-99:139-148. doi: 10.1016/s0368-2048(98)00283-7

The interaction between vapor-deposited Al atoms and methylester-terminated self-assembled monolayers studied by time-of-flight secondary ion mass spectrometry, X-ray photoelectron spectroscopy and infrared reflectance spectroscopy

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