The Role of Group‐V Impurities in Defect Formation in Irradiated Silicon

O. O. Awadelkarim, A. Henry, B. Monemar, J. L. Lindström

Research output: Contribution to journalArticlepeer-review

4 Scopus citations


Direct experimental evidence is provided on the involvement of phosphorus in the structure of the defect that is associated with a prominent electron trap at Ec −0.42eV (Ec is the conduction band edge) in irradiated n‐type silicon. Possible vacancy participation in the formation of the same defect is inferred from the defect production in float‐zone und Czochralski‐grown material. However, it may not be concluded from this study whether a single phosphorus atom and a single vacancy (i.e. the E‐centre) are the only defect constituents. Similar conclusions are also arrived at for an electron trap observed at Ec −0.30eV. These two traps are metastable, a property observed here only in phosphorus‐related defects. Electron traps at Ec −0.34 eV and Ec −0.51 eV are associated with defects containing arsenic and antimony, respectively.

Original languageEnglish (US)
Pages (from-to)539-546
Number of pages8
Journalphysica status solidi (a)
Issue number2
StatePublished - Aug 16 1990

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


Dive into the research topics of 'The Role of Group‐V Impurities in Defect Formation in Irradiated Silicon'. Together they form a unique fingerprint.

Cite this