Abstract
The ex situ lift out (EXLO) adhesion forces are reviewed and new applications of EXLO for focused ion beam (FIB)-prepared specimens are described. EXLO is used to manipulate electron transparent specimens on microelectromechanical systems carrier devices designed for in situ electron microscope analysis. A new patented grid design without a support film is described for EXLO. This new slotted grid design provides a surface for holding the specimen in place and also allows for post lift out processing. Specimens may be easily manipulated into a backside orientation to reduce FIB curtaining artifacts with this slotted grid. Large EXLO specimens can be manipulated from Xe+ plasma FIB prepared specimens. Finally, applications of EXLO and manipulation of FIB specimens using a vacuum probe lift out method are shown. The vacuum probe provides more control for placing specimens on the new slotted grids and also allows for easy manipulation into a backside configuration.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1034-1048 |
| Number of pages | 15 |
| Journal | Microscopy and Microanalysis |
| Volume | 21 |
| Issue number | 4 |
| DOIs | |
| State | Published - Apr 30 2015 |
All Science Journal Classification (ASJC) codes
- Instrumentation
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