Abstract
We present an overview of recent results for hydrogen interactions with amorphous silicon (a-Si), based on first-principles calculations. We review the current understanding regarding molecular hydrogen, and show that H2 molecules are far less inert than previously assumed. We then discuss results for motion of hydrogen through the material, as relating to diffusion and defect formation. We present a microscopic mechanism for hydrogen-hydrogen exchange, and examine the metastable ≡ SiH2 complex formed during the exchange process. We also discuss the enhanced stability of Si-D compared to Si-H bonds, which may provide a means of suppressing light-induced defect generation.
Original language | English (US) |
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Pages (from-to) | 275-286 |
Number of pages | 12 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 557 |
State | Published - 1999 |
Event | The 1999 MRS Spring Meeting - Symposium A 'Amorphous and Heterogenous Silicon Thin Films: Fundamentals to Devices' - San Francisco, CA, USA Duration: Apr 5 1999 → Apr 9 1999 |
All Science Journal Classification (ASJC) codes
- General Materials Science
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering