Thermal evolution of defects in semi-insulating 4H SiC

W. E. Carlos, E. R. Glaser, N. Y. Garces, B. V. Shanabrook, M. A. Fanton

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    3 Scopus citations

    Abstract

    High temperature anneals were used to study the evolution of native defects in semiinsulating (SI), ultrahigh purity SiC using electron paramagnetic resonance (EPR), infrared and visible photoluminescence (PL) and COREMA (Contactless Resistivity Mapping) measurements. In EPR we observe a defect that we tentatively identify as VC-CSi-VC. The EPR intensities of this defect and the UD1 IRPL increase significantly with annealing in all samples.

    Original languageEnglish (US)
    Title of host publicationSilicon Carbide and Related Materials 2005, - Proceedings of the International Conference on Silicon Carbide and Related Materials 2005
    PublisherTrans Tech Publications Ltd
    Pages531-534
    Number of pages4
    EditionPART 1
    ISBN (Print)9780878494255
    DOIs
    StatePublished - 2006
    EventInternational Conference on Silicon Carbide and Related Materials 2005, (ICSCRM 2005) - Pittsburgh, PA, United States
    Duration: Sep 18 2005Sep 23 2005

    Publication series

    NameMaterials Science Forum
    NumberPART 1
    Volume527-529
    ISSN (Print)0255-5476
    ISSN (Electronic)1662-9752

    Other

    OtherInternational Conference on Silicon Carbide and Related Materials 2005, (ICSCRM 2005)
    Country/TerritoryUnited States
    CityPittsburgh, PA
    Period9/18/059/23/05

    All Science Journal Classification (ASJC) codes

    • General Materials Science
    • Condensed Matter Physics
    • Mechanics of Materials
    • Mechanical Engineering

    Fingerprint

    Dive into the research topics of 'Thermal evolution of defects in semi-insulating 4H SiC'. Together they form a unique fingerprint.

    Cite this