Abstract
According to some embodiments, a first layer of doped material may be provided to form a resistor. A second layer of undoped material may then be formed on the first layer. The first layer might comprise, for example, a layer of doped silicon carbide while the second layer comprises a layer of undoped silicon carbide. The resistance of the resistor may then be measured to determine a temperature.
Original language | English (US) |
---|---|
Patent number | US7880580B2 |
State | Published - Feb 1 2011 |