Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.
|Original language||English (US)|
|Number of pages||6|
|Journal||Journal of the American Ceramic Society|
|State||Published - Jan 1987|
All Science Journal Classification (ASJC) codes
- Ceramics and Composites
- Materials Chemistry