TY - JOUR
T1 - Thermochemical Nitridation of Microporous Silica Films in Ammonia
AU - BROW, RICHARD K.
AU - PANTANO, CARLO G.
PY - 1987/1
Y1 - 1987/1
N2 - Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.
AB - Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.
UR - http://www.scopus.com/inward/record.url?scp=0023136416&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0023136416&partnerID=8YFLogxK
U2 - 10.1111/j.1151-2916.1987.tb04845.x
DO - 10.1111/j.1151-2916.1987.tb04845.x
M3 - Article
AN - SCOPUS:0023136416
SN - 0002-7820
VL - 70
SP - 9
EP - 14
JO - Journal of the American Ceramic Society
JF - Journal of the American Ceramic Society
IS - 1
ER -