Thin/thick piezoelectric films by electrophoretic deposition

J. Van Tassel; Clive A. Randall

doi:10.1117/12.316863

Thin/thick piezoelectric films by electrophoretic deposition

J. Van Tassel, Clive A. Randall

Research output: Contribution to journal › Conference article › peer-review

3 Scopus citations

Abstract

Electrophoretic deposition (EPD) is a simple, rapid, and low cost method for producing conformal films on patterned electrodes. This paper covers the use of EPD for forming fully dense Lead Zirconate Titanate (PZT) films of twenty microns and less. The three main steps of this process as applied to PZT are covered: 1. Formation of a charged suspension of the starting sub-micron PZT powder, 2. Deposition of the powder particles on an electrode under the influence of a DC electric field, and 3. fluxing and constrained sintering of the resulting particulate deposit to form a dense continuous film. Using this process we have formed six to ten micron PZT films on an alumina substrate, sintered to full density at 900°C. In a fourteen micron film we have achieved a piezoelectric d₃₃ coefficient of 140 picoCoulombs/Newton, and a dielectric constant of 1,000 with a loss tan δ of 0.045.

Original language	English (US)
Pages (from-to)	14-19
Number of pages	6
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3324
DOIs	https://doi.org/10.1117/12.316863
State	Published - 1998
Event	Smart Structures and Materials 1998 SMart Materials Technologies - San Diego, CA, United States Duration: Mar 4 1998 → Mar 5 1998

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.316863

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title = "Thin/thick piezoelectric films by electrophoretic deposition",

abstract = "Electrophoretic deposition (EPD) is a simple, rapid, and low cost method for producing conformal films on patterned electrodes. This paper covers the use of EPD for forming fully dense Lead Zirconate Titanate (PZT) films of twenty microns and less. The three main steps of this process as applied to PZT are covered: 1. Formation of a charged suspension of the starting sub-micron PZT powder, 2. Deposition of the powder particles on an electrode under the influence of a DC electric field, and 3. fluxing and constrained sintering of the resulting particulate deposit to form a dense continuous film. Using this process we have formed six to ten micron PZT films on an alumina substrate, sintered to full density at 900°C. In a fourteen micron film we have achieved a piezoelectric d33 coefficient of 140 picoCoulombs/Newton, and a dielectric constant of 1,000 with a loss tan δ of 0.045.",

author = "{Van Tassel}, J. and Randall, {Clive A.}",

year = "1998",

doi = "10.1117/12.316863",

language = "English (US)",

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note = "Smart Structures and Materials 1998 SMart Materials Technologies ; Conference date: 04-03-1998 Through 05-03-1998",

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TY - JOUR

T1 - Thin/thick piezoelectric films by electrophoretic deposition

AU - Van Tassel, J.

AU - Randall, Clive A.

PY - 1998

Y1 - 1998

N2 - Electrophoretic deposition (EPD) is a simple, rapid, and low cost method for producing conformal films on patterned electrodes. This paper covers the use of EPD for forming fully dense Lead Zirconate Titanate (PZT) films of twenty microns and less. The three main steps of this process as applied to PZT are covered: 1. Formation of a charged suspension of the starting sub-micron PZT powder, 2. Deposition of the powder particles on an electrode under the influence of a DC electric field, and 3. fluxing and constrained sintering of the resulting particulate deposit to form a dense continuous film. Using this process we have formed six to ten micron PZT films on an alumina substrate, sintered to full density at 900°C. In a fourteen micron film we have achieved a piezoelectric d33 coefficient of 140 picoCoulombs/Newton, and a dielectric constant of 1,000 with a loss tan δ of 0.045.

AB - Electrophoretic deposition (EPD) is a simple, rapid, and low cost method for producing conformal films on patterned electrodes. This paper covers the use of EPD for forming fully dense Lead Zirconate Titanate (PZT) films of twenty microns and less. The three main steps of this process as applied to PZT are covered: 1. Formation of a charged suspension of the starting sub-micron PZT powder, 2. Deposition of the powder particles on an electrode under the influence of a DC electric field, and 3. fluxing and constrained sintering of the resulting particulate deposit to form a dense continuous film. Using this process we have formed six to ten micron PZT films on an alumina substrate, sintered to full density at 900°C. In a fourteen micron film we have achieved a piezoelectric d33 coefficient of 140 picoCoulombs/Newton, and a dielectric constant of 1,000 with a loss tan δ of 0.045.

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AN - SCOPUS:0032401296

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Smart Structures and Materials 1998 SMart Materials Technologies

Y2 - 4 March 1998 through 5 March 1998

ER -

Thin/thick piezoelectric films by electrophoretic deposition

Abstract

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