Towards the use of the conformal-evaporated-film-by-rotation technique in fabricating microelectronic circuits and microsystems

R. J. Martín-Palma; C. G. Pantano; A. Lakhtakia

doi:10.1016/j.microrel.2009.01.003

Towards the use of the conformal-evaporated-film-by-rotation technique in fabricating microelectronic circuits and microsystems

R. J. Martín-Palma, C. G. Pantano, A. Lakhtakia

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

We used the conformal-evaporated-film-by-rotation technique to deposit a conformal coating of chalcogenide glass on the external surface of a microsystem-specifically, the outermost surface of a microelectromechanical system comb resonator. We concluded that this technique could complement the multi-step, time-consuming and expensive traditional lithographic processes, resulting in a reduction of the number of steps needed for the fabrication of microsystems and nanosystems.

Original language	English (US)
Pages (from-to)	460-462
Number of pages	3
Journal	Microelectronics Reliability
Volume	49
Issue number	4
DOIs	https://doi.org/10.1016/j.microrel.2009.01.003
State	Published - Apr 2009

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Safety, Risk, Reliability and Quality
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.microrel.2009.01.003

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title = "Towards the use of the conformal-evaporated-film-by-rotation technique in fabricating microelectronic circuits and microsystems",

abstract = "We used the conformal-evaporated-film-by-rotation technique to deposit a conformal coating of chalcogenide glass on the external surface of a microsystem-specifically, the outermost surface of a microelectromechanical system comb resonator. We concluded that this technique could complement the multi-step, time-consuming and expensive traditional lithographic processes, resulting in a reduction of the number of steps needed for the fabrication of microsystems and nanosystems.",

author = "Mart{\'i}n-Palma, {R. J.} and Pantano, {C. G.} and A. Lakhtakia",

note = "Funding Information: The authors gratefully acknowledge use of facilities at the PSU site of NSF NNIN. R.J. Mart{\'i}n-Palma acknowledges financial support from the Ministerio de Educaci{\'o}n y Ciencia (Spain) through Grant No. PR2007-0085 and from the NSF-IMI on New Functionality in Glasses. A. Lakhtakia thanks the Charles Godfrey Binder Endowment at Penn State for partial support.",

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AU - Martín-Palma, R. J.

AU - Pantano, C. G.

AU - Lakhtakia, A.

N1 - Funding Information: The authors gratefully acknowledge use of facilities at the PSU site of NSF NNIN. R.J. Martín-Palma acknowledges financial support from the Ministerio de Educación y Ciencia (Spain) through Grant No. PR2007-0085 and from the NSF-IMI on New Functionality in Glasses. A. Lakhtakia thanks the Charles Godfrey Binder Endowment at Penn State for partial support.

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AB - We used the conformal-evaporated-film-by-rotation technique to deposit a conformal coating of chalcogenide glass on the external surface of a microsystem-specifically, the outermost surface of a microelectromechanical system comb resonator. We concluded that this technique could complement the multi-step, time-consuming and expensive traditional lithographic processes, resulting in a reduction of the number of steps needed for the fabrication of microsystems and nanosystems.

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Towards the use of the conformal-evaporated-film-by-rotation technique in fabricating microelectronic circuits and microsystems

Abstract

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