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Transient analysis of CMOS-gate-driven RLGC interconnects based on FDTD
Xiao Chun Li
, Jun Fa Mao
,
Madhavan Swaminathan
Electrical Engineering
Research output
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Contribution to journal
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Article
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peer-review
63
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Keyphrases
Finite-difference Time-domain
100%
Transient Analysis
100%
Complementary Metal Oxide Semiconductor
100%
Gate Drive
100%
Nonlinear Behavior
40%
Time Delay
40%
High-speed Interconnects
40%
Interconnected Systems
40%
Crosstalk Noise
40%
High Efficiency
20%
Integrated Circuits
20%
Drain Current
20%
Domain-independent
20%
Prediction Accuracy
20%
Discretized
20%
Power-law Model
20%
Good Accuracy
20%
Second-order Accuracy
20%
Linear Circuits
20%
HSPICE
20%
Piecewise Linear Function
20%
Interconnect Analysis
20%
Drain Voltage
20%
Deep Submicron Technology
20%
Alpha Power
20%
Constant Resistance
20%
Signal Integrity Analysis
20%
Lossy Transmission Line
20%
Engineering
Time Domain
100%
Transient Analysis
100%
Complementary Metal-Oxide-Semiconductor
100%
Interconnects
100%
Nonlinear Behavior
40%
Delay Time
40%
Crosstalk
40%
Experimental Result
20%
Current Drain
20%
Feature Size
20%
Linear Function
20%
Accurate Prediction
20%
Power Law Model
20%
Good Accuracy
20%
Explicit Form
20%
Drain Voltage
20%
Dependent Loss
20%
Boundary Condition
20%
Integrated Circuit
20%
Lossy Transmission Line
20%
Alpha Power
20%
Linear Circuit
20%