TY - JOUR
T1 - Tri-layer a-Si
T2 - H integrated circuits on polymeric substrates
AU - Thomasson, Daniel B.
AU - Bonse, Mathias
AU - Huang, Jiunn Ru
AU - Wronski, Christopher R.
AU - Jackson, Thomas Nelson
PY - 1998
Y1 - 1998
N2 - Using a thermal mountant, we have fabricated hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFTs) and integrated circuits on both colored and nearly colorless polyimide substrates with performance very similar to devices fabricated on glass substrates. Delay and power dissipation were measured with ring oscillators; minimum stage delay was less than 10 μsec, and minimum power dissipation was less than 10 μW per stage. These results indicate that with suitable thermal engineering, a-Si:H devices and circuits can be fabricated on polymeric substrates using nearly standard processing.
AB - Using a thermal mountant, we have fabricated hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFTs) and integrated circuits on both colored and nearly colorless polyimide substrates with performance very similar to devices fabricated on glass substrates. Delay and power dissipation were measured with ring oscillators; minimum stage delay was less than 10 μsec, and minimum power dissipation was less than 10 μW per stage. These results indicate that with suitable thermal engineering, a-Si:H devices and circuits can be fabricated on polymeric substrates using nearly standard processing.
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M3 - Article
AN - SCOPUS:0032257648
SN - 0163-1918
SP - 253
EP - 256
JO - Technical Digest - International Electron Devices Meeting
JF - Technical Digest - International Electron Devices Meeting
ER -