Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching

Sean M. Pursel; Mark W. Horn; Akhlesh Lakhtakia

doi:10.1117/1.2721543

Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching

Sean M. Pursel, Mark W. Horn, Akhlesh Lakhtakia

Research output: Contribution to journal › Article › peer-review

25 Scopus citations

Abstract

Postdeposition chemical etching of spectral-hole filters, which were fabricated as chiral sculptured thin films with central 90-deg-twist defects, decreases the cross-sectional dimensions of the helical columns that such films comprise and blueshifts the spectral holes, thereby establishing the efficacy of postdeposition chemical etching as a means to tune the optical response characteristics of sculptured thin films.

Original language	English (US)
Article number	040507
Journal	Optical Engineering
Volume	46
Issue number	4
DOIs	https://doi.org/10.1117/1.2721543
State	Published - Apr 2007

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics
General Engineering

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@article{30d4dd315fa6434abc600e266d9cd2c3,

title = "Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching",

abstract = "Postdeposition chemical etching of spectral-hole filters, which were fabricated as chiral sculptured thin films with central 90-deg-twist defects, decreases the cross-sectional dimensions of the helical columns that such films comprise and blueshifts the spectral holes, thereby establishing the efficacy of postdeposition chemical etching as a means to tune the optical response characteristics of sculptured thin films.",

author = "Pursel, {Sean M.} and Horn, {Mark W.} and Akhlesh Lakhtakia",

note = "Funding Information: This research was funded in part by the Penn State Materials Research Institute and the Penn State node of the NSF-funded Materials Research Science and Engineering Center. Components of the work reported were conducted at the Penn State node of the NSF-funded National Nanotechnology Infrastructure Network. The authors thank an anonymous reviewer for suggestions that improved this paper.",

year = "2007",

month = apr,

doi = "10.1117/1.2721543",

language = "English (US)",

volume = "46",

journal = "Optical Engineering",

issn = "0091-3286",

publisher = "SPIE",

number = "4",

}

TY - JOUR

T1 - Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching

AU - Pursel, Sean M.

AU - Horn, Mark W.

AU - Lakhtakia, Akhlesh

N1 - Funding Information: This research was funded in part by the Penn State Materials Research Institute and the Penn State node of the NSF-funded Materials Research Science and Engineering Center. Components of the work reported were conducted at the Penn State node of the NSF-funded National Nanotechnology Infrastructure Network. The authors thank an anonymous reviewer for suggestions that improved this paper.

PY - 2007/4

Y1 - 2007/4

N2 - Postdeposition chemical etching of spectral-hole filters, which were fabricated as chiral sculptured thin films with central 90-deg-twist defects, decreases the cross-sectional dimensions of the helical columns that such films comprise and blueshifts the spectral holes, thereby establishing the efficacy of postdeposition chemical etching as a means to tune the optical response characteristics of sculptured thin films.

AB - Postdeposition chemical etching of spectral-hole filters, which were fabricated as chiral sculptured thin films with central 90-deg-twist defects, decreases the cross-sectional dimensions of the helical columns that such films comprise and blueshifts the spectral holes, thereby establishing the efficacy of postdeposition chemical etching as a means to tune the optical response characteristics of sculptured thin films.

UR - http://www.scopus.com/inward/record.url?scp=34250705355&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34250705355&partnerID=8YFLogxK

U2 - 10.1117/1.2721543

DO - 10.1117/1.2721543

M3 - Article

AN - SCOPUS:34250705355

SN - 0091-3286

VL - 46

JO - Optical Engineering

JF - Optical Engineering

IS - 4

M1 - 040507

ER -

Tuning of sculptured-thin-film spectral-hole filters by postdeposition etching

Abstract

All Science Journal Classification (ASJC) codes

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