Ultraviolet radiation induced degradation of poly-para-xylylene (parylene) thin films

J. B. Fortin; T. M. Lu

doi:10.1016/S0040-6090(01)01355-4

Ultraviolet radiation induced degradation of poly-para-xylylene (parylene) thin films

J. B. Fortin, T. M. Lu

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Abstract

The effect of ultraviolet (UV) radiation of λ≥250 nm on the thermal stability, electrical and optical properties of thin poly-para-xylylene (parylene) thin films was studied. Evidence of slight oxidation of the UV treated film was seen using Fourier-transform infrared spectroscopy. Thermal desorption spectrometry and thickness change after annealing were used to analyze the thermal stability of as-deposited and UV-treated parylene thin films. The thermal stability of the UV treated films was seen to decease as the radiation dose increased. Electrical measurements revealed an increase in the leakage current density, the dielectric constant and the dissipation factor of UV treated films. No change was seen in the refractive index at 634 nm.

Original language	English (US)
Pages (from-to)	223-228
Number of pages	6
Journal	Thin Solid Films
Volume	397
Issue number	1-2
DOIs	https://doi.org/10.1016/S0040-6090(01)01355-4
State	Published - Nov 1 2001

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/S0040-6090(01)01355-4

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title = "Ultraviolet radiation induced degradation of poly-para-xylylene (parylene) thin films",

abstract = "The effect of ultraviolet (UV) radiation of λ≥250 nm on the thermal stability, electrical and optical properties of thin poly-para-xylylene (parylene) thin films was studied. Evidence of slight oxidation of the UV treated film was seen using Fourier-transform infrared spectroscopy. Thermal desorption spectrometry and thickness change after annealing were used to analyze the thermal stability of as-deposited and UV-treated parylene thin films. The thermal stability of the UV treated films was seen to decease as the radiation dose increased. Electrical measurements revealed an increase in the leakage current density, the dielectric constant and the dissipation factor of UV treated films. No change was seen in the refractive index at 634 nm.",

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AU - Lu, T. M.

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N2 - The effect of ultraviolet (UV) radiation of λ≥250 nm on the thermal stability, electrical and optical properties of thin poly-para-xylylene (parylene) thin films was studied. Evidence of slight oxidation of the UV treated film was seen using Fourier-transform infrared spectroscopy. Thermal desorption spectrometry and thickness change after annealing were used to analyze the thermal stability of as-deposited and UV-treated parylene thin films. The thermal stability of the UV treated films was seen to decease as the radiation dose increased. Electrical measurements revealed an increase in the leakage current density, the dielectric constant and the dissipation factor of UV treated films. No change was seen in the refractive index at 634 nm.

AB - The effect of ultraviolet (UV) radiation of λ≥250 nm on the thermal stability, electrical and optical properties of thin poly-para-xylylene (parylene) thin films was studied. Evidence of slight oxidation of the UV treated film was seen using Fourier-transform infrared spectroscopy. Thermal desorption spectrometry and thickness change after annealing were used to analyze the thermal stability of as-deposited and UV-treated parylene thin films. The thermal stability of the UV treated films was seen to decease as the radiation dose increased. Electrical measurements revealed an increase in the leakage current density, the dielectric constant and the dissipation factor of UV treated films. No change was seen in the refractive index at 634 nm.

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Ultraviolet radiation induced degradation of poly-para-xylylene (parylene) thin films

Abstract

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