Unified control approach for an electron beam physical vapour deposition process

A. S. Lewis, S. D. Brown, R. L. Tutwiler

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

This paper presents a unified approach for the automatic control of an electron beam physical vapour deposition (EBPVD) process. Images of the melt pool are analyzed on a block-by-block basis and a technique to identify critical regions of the melt pool, as would be designated by trained operators, is given. Simulation results demonstrate the feasibility of automating the electron beam steering sequence. In addition, methods to obtain input data describing the melt pool and the incorporation of this data into an overall control strategy that would insure the uniformity of coatings are presented.

Original languageEnglish (US)
Pages (from-to)145-151
Number of pages7
JournalInternational Journal of Robotics and Automation
Volume15
Issue number3
StatePublished - 2000

All Science Journal Classification (ASJC) codes

  • Software
  • Control and Systems Engineering
  • Modeling and Simulation
  • Mechanical Engineering
  • Electrical and Electronic Engineering
  • Artificial Intelligence

Fingerprint

Dive into the research topics of 'Unified control approach for an electron beam physical vapour deposition process'. Together they form a unique fingerprint.

Cite this