Use of e-beam written cgh in optical pattern recognition

R. A. Athale; C. L. Giles; J. A. Blodgett

doi:10.1117/12.937129

Use of e-beam written cgh in optical pattern recognition

R. A. Athale, C. L. Giles, J. A. Blodgett

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.

Original language	English (US)
Pages (from-to)	48-53
Number of pages	6
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	437
DOIs	https://doi.org/10.1117/12.937129
State	Published - Oct 26 1983

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

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10.1117/12.937129

Cite this

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title = "Use of e-beam written cgh in optical pattern recognition",

abstract = "The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.",

author = "Athale, {R. A.} and Giles, {C. L.} and Blodgett, {J. A.}",

year = "1983",

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AU - Giles, C. L.

AU - Blodgett, J. A.

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Y1 - 1983/10/26

N2 - The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.

AB - The E-beam pattern generators, developed for making masks for integrated circuits with submicron features, are extremely attractive for producing high quality computer generated holograms (CGH). The procedure for making the E-beam written CGH along with its properties will be described. Application of these CGH's to spatial frequency multiplexed optical processors for pattern recognition will be discussed.

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JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

ER -

Use of e-beam written cgh in optical pattern recognition

Abstract

All Science Journal Classification (ASJC) codes

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