Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogaps

Keyphrases

• Self-assembled Monolayer 100%
• Molecular Ruler 100%
• Electrical Integrity 100%
• Nanogap 100%
• Nanostructure Fabrication 100%
• Secondary Structure 50%
• Self-assembly 50%
• Photolithography 50%
• Lift-off 50%
• Photoresist 50%
• Metal Deposition 50%
• Control Placement 50%
• Gold Structures 50%
• Lithographic Technique 50%
• Hierarchical Nanostructures 50%
• Complex Nanostructures 50%
• Controlled Thickness 50%
• Molecular Resist 50%
• Electrode Width 50%

Engineering

• Nanomaterial 100%
• Secondary Structure 33%
• Optical Lithography 33%
• Final Product 33%
• Photoresist 33%
• Create Pattern 33%

Material Science

• Nanostructure 100%
• Self Assembly 33%
• Metal Deposition 33%