Abstract
A report is presented on the power performance of deep submicron AlGaN/GaN high electron mobility transistors grown by ammonia molecular beam epitaxy. At 10GHz, 70 power-added-efficiency (PAE) and 3 W/mm power density were demonstrated at a drain bias of 20 V. At 30GHz, 31 PAE and 6.5 W/mm power density were achieved at a drain bias of 40V.
Original language | English (US) |
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Pages (from-to) | 598-599 |
Number of pages | 2 |
Journal | Electronics Letters |
Volume | 44 |
Issue number | 9 |
DOIs | |
State | Published - Apr 28 2008 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering