Abstract
A report is presented on the power performance of deep submicron AlGaN/GaN high electron mobility transistors grown by ammonia molecular beam epitaxy. At 10GHz, 70 power-added-efficiency (PAE) and 3 W/mm power density were demonstrated at a drain bias of 20 V. At 30GHz, 31 PAE and 6.5 W/mm power density were achieved at a drain bias of 40V.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 598-599 |
| Number of pages | 2 |
| Journal | Electronics Letters |
| Volume | 44 |
| Issue number | 9 |
| DOIs | |
| State | Published - 2008 |
All Science Journal Classification (ASJC) codes
- Electrical and Electronic Engineering
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