X-Ray Photoelectron Spectroscopy and Secondary Ion Mass Spectrometry: A Multitechnique Approach to Surface Analysis

A. Shepard, R. W. Hewitt, W. E. Baitinger, G. J. Slusser, Nicholas Winograd, G. L. Ott, W. N. Delgass

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations


The combination of X-ray photoelectron spectroscopy (XPS) with secondary ion mass spectroscopy (SIMS) promises to provide a powerfiil new approach both to quantitative analysis of surface composition and to the elucidation of surface molecular structure. In this work, we have tested our ultrahigh vacuum XPS/SIMS system to characterize a variety of metal, alloy, and metal oxygen surfaces. We report on the examination of clean silver surfaces where ions of clusters up to Agn + where n = 1 to 5 have been observed. Studies have also been carried out on iron/ruthenium catalyst surfaces and on clean indium foils exposed to controlled doses of oxygen. In general, we have tried to illustrate the advantages of this combined technique.

Original languageEnglish (US)
Title of host publicationQuantitive Surface Analysis of Materials
EditorsN. S. Mclntyre
PublisherASTM International
Number of pages17
ISBN (Electronic)9780803105430
StatePublished - 1978
Event1977 Symposium on Progress in Quantitative Surface Analysis - Cleveland, United States
Duration: Mar 2 1977Mar 3 1977

Publication series

NameASTM Special Technical Publication
VolumeSTP 643
ISSN (Print)0066-0558


Conference1977 Symposium on Progress in Quantitative Surface Analysis
Country/TerritoryUnited States

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • General Engineering

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