TY - JOUR
T1 - Xe+-irradiation effects on multilayer thin-film optical surfaces in EUV lithography
AU - Allain, J. P.
AU - Hassanein, A.
AU - Allain, M. M.C.
AU - Heuser, B. J.
AU - Nieto, M.
AU - Chrobak, C.
AU - Rokusek, D.
AU - Rice, B.
N1 - Funding Information:
The XRR, XRD and AFM measurements were performed at the University of Illinois Center for Microanalysis of Materials, which is partially supported by the US Department of Energy under grant DEFG02-91-ER45439. The XRR work at UIUC by B.J. Heuser was supported by National Science Foundation grant DMR-9982520. This work was supported by funding from the Intel Corporation. Also Chrobak and Rokusek were partially supported by Department of Energy Science Undergraduate Laboratory Internship.
PY - 2006/1
Y1 - 2006/1
N2 - In extreme ultraviolet lithography (EUVL) environments, transient plasma dynamics dictate conditions for particle/surface interactions. A critical challenge facing EUVL development is optical component lifetime in both gas-discharge-produced plasmas (DPP) and laser-produced plasma (LPP) devices. Optical components are exposed to impinging fast ions and neutrals, impurities (H, C, O, N) and debris, leading to component degradation and consequently limiting 13.5-nm light reflection intensity. This paper studies Xe+ irradiation-induced mechanisms that affect the performance of EUVL multilayer collector mirror surfaces. Irradiation conditions include: incident particle energies of 1 keV and 5 keV, Xe+ fluences ranging from about 3 × 1014-5 × 1016 Xe+/cm2 and surface temperatures of 273 K and 473 K. Measurements include in situ quartz crystal microbalance for sputtering rate measurements, ion scattering spectroscopy, X-ray reflectivity and atomic force microscopy. Three distinct erosion regimes for bombardment of MLM with Xe+ are: a low Xe + fluence regime below ∼5 × 1014 Xe +/cm2, a moderate regime at fluences between 5 × 1014 and 5 × 1016 Xe+/cm2 and a high fluence regime >1017 Xe+/cm2.
AB - In extreme ultraviolet lithography (EUVL) environments, transient plasma dynamics dictate conditions for particle/surface interactions. A critical challenge facing EUVL development is optical component lifetime in both gas-discharge-produced plasmas (DPP) and laser-produced plasma (LPP) devices. Optical components are exposed to impinging fast ions and neutrals, impurities (H, C, O, N) and debris, leading to component degradation and consequently limiting 13.5-nm light reflection intensity. This paper studies Xe+ irradiation-induced mechanisms that affect the performance of EUVL multilayer collector mirror surfaces. Irradiation conditions include: incident particle energies of 1 keV and 5 keV, Xe+ fluences ranging from about 3 × 1014-5 × 1016 Xe+/cm2 and surface temperatures of 273 K and 473 K. Measurements include in situ quartz crystal microbalance for sputtering rate measurements, ion scattering spectroscopy, X-ray reflectivity and atomic force microscopy. Three distinct erosion regimes for bombardment of MLM with Xe+ are: a low Xe + fluence regime below ∼5 × 1014 Xe +/cm2, a moderate regime at fluences between 5 × 1014 and 5 × 1016 Xe+/cm2 and a high fluence regime >1017 Xe+/cm2.
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U2 - 10.1016/j.nimb.2005.08.188
DO - 10.1016/j.nimb.2005.08.188
M3 - Article
AN - SCOPUS:28544448123
SN - 0168-583X
VL - 242
SP - 520
EP - 522
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
IS - 1-2
ER -