Keyphrases
Plasma-enhanced Chemical Vapor Deposition (PECVD)
100%
Device Fabrication
100%
Thin-film Circuits
100%
Chemical Vapor Deposition Processes
100%
Thin Film Fabrication
100%
ZnO Thin Film Transistor
100%
ZnO Thin Films
100%
Thin Film Devices
100%
Low-temperature Plasma
100%
Aluminum Oxide
66%
Interface States
66%
Thin-film Transistors
66%
Gate Leakage
66%
In Situ
33%
Low Temperature
33%
Integrated Circuits
33%
Subthreshold Slope
33%
Field-effect Mobility
33%
Oscillation Frequency
33%
Threshold Voltage
33%
Low Leakage
33%
Low Mobility
33%
Five Stages
33%
Ring Oscillator
33%
Inverter Circuit
33%
Engineering
Thin Films
100%
Low-Temperature
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Deposition Process
100%
Thin-Film Transistor
100%
Temperature Plasma
100%
Interface State
40%
Integrated Circuit
20%
Deposited Film
20%
Subthreshold Slope
20%
Material Science
Electronic Circuit
100%
Thin Films
100%
Plasma-Enhanced Chemical Vapor Deposition
100%
ZnO
100%
Vapor Phase Deposition
100%
Thin-Film Transistor
83%
Film
16%
Physics
Thin Films
100%
Vapor Deposition
100%
Cold Plasma
100%
Integrated Circuit
16%
Field Effect
16%
Threshold Voltage
16%